A Short Review on the Synthesis of Electrodeposited Thin Films

Nanostructured thin films have been prepared by using various deposition techniques. The obtain
films showed unique physical, optical and electrical properties. Therefore, these materials could be
used in solar cell, optoelectronic, laser and sensor devices. In this work, the preparation of metal
chalcogenide thin films by using electrodeposition method was reported. Electrodeposition method
has many advantages such as low temperature is required, low cost investment, can produce desired
film over large surface area and can control the thickness of the film. Characterization of obtained
films was investigated by using various tools. The band gap values are in the range of 1.15 to 2.19
eV. Annealed films indicated excellent crystallinity if compared to as-deposited films.